Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1997-03-31
2000-08-15
McDonald, Rodney
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20429807, 20429811, 20429823, 20429825, C23C 1434
Patent
active
061030694
ABSTRACT:
The present invention provides a vacuum chamber that reduces the amount of time required to draw a vacuum after replacing consumables or performing routine maintenance by preserving the vacuum in a portion of the chamber. More particularly, the chamber isolates a frequently replaced consumable or component in a first portion of the chamber so that only the first portion of the chamber is exposed to the surrounding environment and the volume of gas or air that must be re-evacuated is reduced. A gate valve is provided to form a seal with a valve seat that is either formed into the chamber wall or provided by a valve body. Once the second portion is sealed, a lid to the first portion may be opened for access.
REFERENCES:
patent: 3206322 (1965-09-01), Morgan
patent: 3641973 (1972-02-01), Shrader
patent: 3921572 (1975-11-01), Brunner et al.
patent: 4294678 (1981-10-01), Kuehnle
patent: 4338883 (1982-07-01), Mahler
patent: 4519885 (1985-05-01), Innis
patent: 5065698 (1991-11-01), Koike
patent: 5112185 (1992-05-01), Koike
patent: 5223112 (1993-06-01), Tepman
patent: 5372693 (1994-12-01), Brauer et al.
patent: 5380414 (1995-01-01), Tepman
patent: 5429729 (1995-07-01), Kamei et al.
patent: 5571331 (1996-11-01), Schertler et al.
patent: 5624536 (1997-04-01), Wada et al.
Communication Dated Oct. 31, 1998 and Austrian Search Report.
Communication Dated Jul. 20, 1998 and European Search Report.
Annex to the European Search Report on European No. EP 98 30 2504.
Applied Materials Inc.
McDonald Rodney
LandOfFree
Chamber design with isolation valve to preserve vacuum during ma does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Chamber design with isolation valve to preserve vacuum during ma, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chamber design with isolation valve to preserve vacuum during ma will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2002760