Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1996-10-25
1997-11-11
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 20429817, 20429819, 2042982, 20429822, C23C 1434
Patent
active
056859597
ABSTRACT:
A cathode assembly having a magnetic-field shunt for use in a magnetron sputtering apparatus is described. The magnetic-field shunt disposed between a sputtering target and a source of magnetic flux, and the shunt is moveable between first and second positions to effect preferential target erosion at first and second target regions, respectively. A method of using the assembly for preparation of a magnetic recording medium is also described.
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Bourez Allen J.
Lal Brij Bihari
Russak Michael A.
Dehlinger Peter J.
HMT Technology Corporation
Mohr Judy M.
Nguyen Nam
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