Carbon target material for forming carbon thin film and process

Details Carbon target material for forming carbon thin film and process Carbon target material for forming carbon thin film and process

1996-11-05

1998-10-06

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419216, 2041922, C23C 1434

Patent

active

058172190

ABSTRACT:
A carbon target material for forming a carbon thin film, includes a vitreous carbon produced from a polycarbodiimide resin. A process for producing a carbon target material for forming a carbon thin film includes molding into an appropriate shape a polycarbodiimide or a composition primarily composed of a polycarbodiimide and then carbonizing the resulting shaped material.
The carbon target material for forming a carbon thin film; causes no abnormal discharge during sputtering generates no powder leading to contamination during sputtering, and has high purity.

REFERENCES:
patent: 4612100 (1986-09-01), Edeling et al.
patent: 4774130 (1988-09-01), Endo et al.
patent: 5110676 (1992-05-01), Murai et al.
patent: 5122249 (1992-06-01), Niemann et al.
patent: 5152941 (1992-10-01), Takaku et al.
patent: 5453168 (1995-09-01), Nelson et al.

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