Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1996-12-18
1998-04-21
Turner, Archene
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041921, 20419215, 20419223, 427123, 4271261, 427127, 427128, 427129, 427130, 427131, 427132, G11B 1110
Patent
active
057414033
ABSTRACT:
Substrates are disclosed having an ultra-smooth surface finish thereon rendering them useful in making high density magnetic storage components, such as a computer hard disk or thin-film head which can read and/or write data on such disks. The substrates are comprised of a non-oxide ceramic base which is coated with a smoothing layer comprised of amorphous, non-stoichiometric silicon carbide corresponding to the formula SiC.sub.x, wherein x is the molar ratio of carbon to silicon and is greater than 1. Also disclosed are processes for making the substrates and components.
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Ruppel Irving B.
Tenhover Michael A.
DiMauro Thomas M.
The Carborundum Company
Turner Archene
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