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Sputtering target

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target and assembly

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target and method for finishing surface of such...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target and method for making composite soft...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target and method of manufacturing the same

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target and process for producing si oxide film...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target and production method thereof

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target assembly

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target assembly and method for depositing a...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target assembly for a sputter coating apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target assembly having solid-phase bonded interface

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target for depositing ferroelectric film, method for

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target for phase-change memory, film for phase...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target for producing optical recording medium

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sputtering target for producing optically transparent layers and

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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