Sputtering target for producing optically transparent layers and

Details Sputtering target for producing optically transparent layers and Sputtering target for producing optically transparent layers and

1988-05-19

1990-07-24

Niebling, John F.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

75228, 20419227, 419 38, 419 41, C23C 1434, C03C 1709

Patent

active

049433628

ABSTRACT:
Sputter targets of bismuth with 0.2 to 10% by weight manganese for producing optically transparent surface layers which reflect heat in combination with silver layers on panes of glass and of plastic achieve an improved resistance to UV in silver layers if the manganese is present in the form of the intermetallic compound BiMn in an even, finely dispersed distribution within the metallic bismuth matrix.

REFERENCES:
patent: 4610771 (1986-09-01), Gillery
John L. Vossen et al., Thin Film Processes, Academic Press, 1978, New York, pp. 41-42.

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