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R-F electrodes for removably providing electrical energy to an a

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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R.F. Sputtering apparatus including multi-network power supply

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Radio frequency etch table with biased extension member

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Radio-frequency coil for use in an ionized physical vapor...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Reaction apparatus for biochemical examination

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Reactive ion etching apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Reactive ion etching apparatus with interlaced perforated anode

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Reactive ion etching chamber

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Reactive sputter etching apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Reactive sputtering apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Reactive sputtering system

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Reactor for plasma desmear of high aspect ratio hole

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Recessed bonding of target for RF diode sputtering

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Recessed coil for generating a plasma

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Recessed sputter target

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Rectangular cavity magnetron sputtering vapor source

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Rectangular magnetron sputtering cathode with high target...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Rectangular target plate for cathode sputtering apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Rectilinear sputtering apparatus and method

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Reduced pressure surface treatment apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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