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Sacrificial cathode target for sputtering cathode assembly

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sample applying position marking device for film for electrophor

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sample concentrator

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sample feeder for use in automatic electrophoresis system

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sample handling system

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sample mount for performing sputter-deposition in a focused...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sample tray feeding apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sample well insert with wedge-shaped profile for ultra-thin slab

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Seal construction for electrostatic fluid treaters

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sealing apparatus for a vacuum processing system

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sealing frame for stacked arrangement of exchanger membranes for

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Sealing gasket for chamber wall

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Segmented electrophoretic separation system useful for lipid pro

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Self ionized plasma sputtering

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Self-aligned sputter deposition masking device and method

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Semiconductor device

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Semiconductor device having a discharge-formed insulating film

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Semiconductor device having porous anodized aluminum isolation b

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Semiconductor device manufacturing apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Semiconductor fabrication apparatus having improved sputtering c

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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