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Hafnium silicide target for gate oxide film formation and...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Hard film cutting tools, cutting tool coated with hard film,...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Heat reflecting composite films and glazing products containing

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Heat treated and sintered sputtering target

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Heating system for high throughput sputtering

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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High adhesion performance roll sputtered strike layer

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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High capacity sputter-etching apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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High density plasma deposition and etching apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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High density plasma deposition and etching apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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High flow gas manifold for high rate, off-axis sputter depositio

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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High frequency plasma source

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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High frequency sputtering device

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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High magnetic flux permanent magnet array apparatus and method f

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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High magnetic flux sputter targets with varied magnetic...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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High peak power plasma pulsed supply with arc handling

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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High performance capillary gel electrophoresis

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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High power capacity magnetron cathode

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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High pressure magnetron cathode assembly and sputtering apparatu

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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High purity cobalt sputter target and process of...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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High purity cobalt sputtering targets

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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