Sputtering target

Details Sputtering target Sputtering target

1983-08-03

1984-08-28

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

044683138

ABSTRACT:
A sputtering target comprises a backing plate, a mosaic layer laid on the backing plate, and a keep jig contacting the inner peripheral edge and outer peripheral edge of the mosaic layer, thus attaching the layer to the backing plate. The mosaic layer is substantially circular and consists of a first group of fan-shaped plates made of a first target material and a second group of fan-shaped plates of a second target material. The plates of the second group are divided into subgroups each consisting of at least one plate. These subgroups are interposed among the fan-shaped plates of the first group. The plates have a notch in the narrower end, are connected side by side to each other, and are arranged with top surfaces flush with one another.

REFERENCES:
patent: 3502562 (1970-03-01), Humphries
patent: 4200510 (1980-04-01), O'Connell et al.
patent: 4297189 (1981-10-01), Smith et al.
Sinclair et al., Review of Scientific Instruments, 33 (#7) 1962, pp. 744-747.
Hanak, Proc. 6th Intern. Vacuum Cong. 1974; J. Appl. Phys., Suppl. 2, Pt. 1, 1974, pp. 809-811.

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