Sputtering target and method for making composite soft...

Details Sputtering target and method for making composite soft... Sputtering target and method for making composite soft...

2006-05-09

2006-05-09

Versteeg, Steven (Department: 1753)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S192200, C204S192120, C204S192150

Reexamination Certificate

active

07041205

ABSTRACT:
High-saturation magnetization composite soft magnetic films can be deposited with sintered targets made of preferably at least two kinds of powders/elements with much lower saturation magnetization than that of the deposited soft magnetic films. Such a high-saturation magnetization composite soft magnetic film can be deposited by sputtering a plurality of species from a sintered target that forms a film of a material of higher saturation magnetization than that of the species.

REFERENCES:
patent: 6033536 (2000-03-01), Ichihara et al.
patent: 6692619 (2004-02-01), Chen et al.

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