LandOfFree - US Patents - Listing for Chemistry: electrical and wave energy,Apparatus,Coating, forming or etching by sputtering

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Fabrication method and structure of optical waveguides

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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Facing target type sputtering apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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Facing targets sputtering device

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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Facing-targets-type sputtering apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Reexamination Certificate

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Feed through for application of HF energy

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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Ferroelectric apparatus for dielectrophoresis particle extractio

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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Ferromagnetic high speed sputtering apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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Ferromagnetic high speed sputtering apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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FET electrode with carbon gate

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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Fiber optic flow cell for detection of electrophoresis separatio

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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Field generator for generating an electrostatic field in a body

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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Field-inversion gel electrophoresis

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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Fill port seal with first and second photosensitizers

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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Film comprising silicon dioxide as the main component and method

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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Film forming apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Reexamination Certificate

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Film forming apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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Film forming apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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Film forming apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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Film forming apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Reexamination Certificate

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Film forming apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Patent

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