Sputtering target

Details Sputtering target Sputtering target

1989-05-01

1990-10-30

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429813, 20419215, C23C 1434

Patent

active

049666762

ABSTRACT:
A sputtering target divided into respective target elements of two or more types arranged as a composite on a substrate, is disclosed. A thin sheet whose constituent material comprises one or more of the constituent materials of the target elements, and whose constituent material includes at least one metal material, is interposed between said substrate and target elements.

REFERENCES:
patent: 4209375 (1980-06-01), Gates et al.
patent: 4430190 (1984-02-01), Eilers et al.
patent: 4468313 (1984-08-01), Okumura et al.
patent: 4569745 (1986-02-01), Nagashima

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