Sputtering target assembly for a sputter coating apparatus

Details Sputtering target assembly for a sputter coating apparatus Sputtering target assembly for a sputter coating apparatus

1992-06-15

1993-12-14

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429818, C23C 1434

Patent

active

052694038

ABSTRACT:
A sputtering target assembly for a sputter coating apparatus includes a spacing ring which is threaded to a target holder and a target which attaches to the spacing ring at one side and fits into the target holder at another side. The target holder fits into a cathode body which functions as a magnetic pole piece, a portion of a cooling system, and a mechanical stabilizer for the target. The target holder also provides cooling, using cooling passages and the spacing means which is threaded to the target holder. The sputtering target has an arch-like face which promotes a controlled plastic deformation in a preselected direction, so that heating expansion during operation results in the target being urged into forceful and close contact with at least two cooled surfaces.

REFERENCES:
patent: 4385979 (1983-05-01), Pierce et al.
patent: 4855033 (1989-08-01), Hurwitt

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