Sputter coating apparatus having improved target electrode struc
Sputter coating power processing portion
Sputter coating source
Sputter coating source having plural target rings
Sputter deposition for multi-component thin films
Sputter device
Sputter etching apparatus having a second electrically floating
Sputter etching chamber with improved uniformity
Sputter ion source for boron and other targets
Sputter ions source
Sputter magnetron having two rotation diameters
Sputter module for modular wafer processing machine
Sputter module for modular wafer processing system
Sputter source with a target arrangement and a holding device
Sputter station
Sputter system incorporating an improved blocking shield for con
Sputter target design
Sputter target for cathodic atomization to produce transparent,
Sputter target for eliminating redeposition on the target sidewa
Sputter target for eliminating redeposition on the target sidewa