Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1998-10-03
2000-05-09
McDonald, Rodney
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429811, C23C 1434
Patent
active
060599456
ABSTRACT:
An improved sputter target and shield eliminate redeposition of sputtered material onto the target and prevents the formation of deposits on the electrically insulative member between the target and enclosure wall. The sputter target is designed to allow the plasma to sputter the entire sidewall of the target while the a narrow passage between the target, backing plate and shield protects the insulative member from line-of-sight deposition, prevents formation of a plasma within the passage without causing arcing between the backing plate and shield. The target of the present invention is generally disk-shaped with a sloped or frustoconical sidewall surface around the perimeter edge.
REFERENCES:
patent: 5529673 (1996-06-01), Strauss et al.
patent: 5538603 (1996-07-01), Guo
patent: 5580428 (1996-12-01), Krivokapic et al.
patent: 5658442 (1997-08-01), Van Gogh et al.
patent: 5690795 (1997-11-01), Rosenstein et al.
Lester, et al., IBM Tech. Discl. Bulletin, "Sputtering Cathode Glow Suppression Shields", Aug., 1977, vol. 20, No. 3, pp. 1177-1178.
U.S. application No. 08/702,823, Fu, et al., filed Aug. 23, 1996.
Fu Jianming
Gogh James van
Applied Materials Inc.
McDonald Rodney
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