Sputter source with a target arrangement and a holding device

Details Sputter source with a target arrangement and a holding device Sputter source with a target arrangement and a holding device

1995-11-20

1998-11-10

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, 20429812, C23C 1434

Patent

active

058338233

ABSTRACT:
A sputter source and a corresponding target and holding device are provided in which the target is held by form locking arrangements. The target is pushed in an x-direction in the manner of a sliding drawer and is fixed by a releasable lock. A foil, which defines a cooling system on the holding device side, braces the fixed target when the cooling system is acted upon by pressure.

REFERENCES:
patent: 5066381 (1991-11-01), Ohta et al.
patent: 5071535 (1991-12-01), Hartig et al.
patent: 5269894 (1993-12-01), Kerschbaumer

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