Sputter ions source

Details Sputter ions source Sputter ions source

2005-08-16

2005-08-16

Versteeg, Steven (Department: 1753)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298060

Reexamination Certificate

active

06929725

ABSTRACT:
A sputter ion source includes an ionizer; a sputter cathode, including a cathode, a sputter insert, and a shielding cap; a forming electrode; cathode insulator; a hollow, cylindrical shielding cathode, surrounding the sputter cathode, and tapered rotationally symmetrically in the region of the sputter insert; and a vacuum-tight housing for enclosing all of the foregoing. The sputter ion source has a prolonged operating life, low maintenance costs, and prevents atomization of parts of the ion source, for generating negative ions, in the vicinity of the cathode insert.

REFERENCES:
patent: 4123686 (1978-10-01), Keller et al.
Dec. 2, 1990 “The AMS System at the Shanghai Institute of Nuclear Research” Liu Lianfan et al. Nuclear Instruments & Methods in Physics Research, Section -B: Beam Interactions with Materials and Atoms, North-Holland Publishing Company. Amsterdam, NL, Bd. B52, Nr. 3/4 pp. 298-300.
Sep. 1, 1983 “A Versatile High Intensity Negative Ion Source” R. Middleton Nuclear Instruments and Methods, Bd. 214, pp. 139-150.
Jan. 2, 1992 “The Hvee Tandetron Line; New Developments and Design Considerations” Mous D J W et al. Nuclear Instruments & Methods in Physics Research, Section -B; Beam Interactions with Materials and Atoms, North-Holland Publishing Company. Amsterdam, NL, Bd. B62, Nr. 3 pp. 421-424.
Feb. 1, 1993 “Ion Sources for Accelerators in Materials Research” Alton G D Nuclear Instruments & Methods in Physics Research, Section -B: Beam Interactions with Materials and Atoms, North-Holland Publishing Company. Amsterdam, NL. Bd. B73, Nr. 2. pp. 221-288.
1993; Ion Sources For Accelerators in Materials Research; G.D. Alton; Nuclear Instruments and Methods in Physics Research; pp. 221-288.
Apr. 2, 1993; Sputter Ion Source; High Voltage Engineering Europa B.V.; pp. 1-18.

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