Sputter target for cathodic atomization to produce transparent,

Details Sputter target for cathodic atomization to produce transparent, Sputter target for cathodic atomization to produce transparent,

1994-11-09

1996-01-02

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419229, 501134, 264 65, C23C 1434, C04B 35457

Patent

active

054805325

ABSTRACT:
A target for production of transparent electrically conductive layers by cathode sputtering is produced from indium oxide-tin oxide powder mixtures or coprecipitated indium oxide-tin oxide powders. A target with especially high mechanical strength consists of an oxide ceramic material into which metallic phase components have been incorporated in a uniform and finely distributed manner and which has a density of more than 96% of the theoretical density of indium oxide/tin oxide consisting purely of oxide.

REFERENCES:
patent: 4456549 (1984-06-01), Kano et al.
patent: 4647548 (1987-03-01), Klein
patent: 4962071 (1990-10-01), Bayard
patent: 5071800 (1991-12-01), Iwamoto et al.
patent: 5094787 (1992-03-01), Nakajima
patent: 5160675 (1992-11-01), Iwamoto et al.
patent: 5401701 (1995-03-01), Ogawa et al.
patent: 5433901 (1995-07-01), Rancoule et al.
Hofer, B. Anwendung des HIP-verfahrens bei keramischen wenkstoffen, Keramische Zeitschrift, 36. Jg, Nr. 7, 1984, pp. 352-354.

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