Sputter module for modular wafer processing machine

Details Sputter module for modular wafer processing machine Sputter module for modular wafer processing machine

1987-09-18

1989-07-25

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, C23C 1434

Patent

active

048511013

ABSTRACT:
A sputter coating module for a multifunction processing machine is provided in which the supporting mechanism for the workpiece can be isolated from the sputtering source, the pumps and other processing apparatus for cleaning without exposing the entire machine to atmosphere. The supporting mechanism which is rotatable from the horizontal to the vertical is hollow and mounted on hollow vacuum-sealed trunnions to allow passage of water, argon, and dry-nitrogen or air at atmospheric pressure into the interior of the supporting mechanism.

REFERENCES:
patent: 4405435 (1983-09-01), Tateishi et al.
patent: 4548699 (1985-10-01), Hutchinson et al.
patent: 4670126 (1987-06-01), Messer et al.
patent: 4674621 (1987-06-01), Takahashi
patent: 4701251 (1987-10-01), Beardow
patent: 4747928 (1988-05-01), Takahashi et al.

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