Formation of a masking layer on a dielectric region to...
Formation of electrical contacts to conductive elements in...
Formation of interconnect structures by removing sacrificial...
Formation of ohmic contacts in III-nitride light emitting...
Formation of oxidation-resistant seed layer for interconnect...
Formation of silicided junctions in deep submicron MOSFETS by de
Forming a porous dielectric layer
Forming local interconnects in integrated circuits
Forming of the last metallization level of an integrated...
Forming thick metal interconnect structures for integrated...
Freestanding multilayer IC wiring structure
Fretting and whisker resistant coating system and method
Fully encapsulated metal leads for multi-level metallization
Fuse-structure
Fusing nanowires using in situ crystal growth
Gallium nitride-based III-V group compound semiconductor
Gallium nitride-based III-V group compound semiconductor
Gallium nitride-based III-V group compound semiconductor
Gallium nitride-based III-V group compound semiconductor...
GaN-based III—V group compound semiconductor device...