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Selected: E

Exempt source for an x-ray fluorescence device

X-ray or gamma ray systems or devices – Specific application – Fluorescence
Reexamination Certificate

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Explosive detection method and apparatus using selective gamma r

X-ray or gamma ray systems or devices – Specific application – Absorption
Patent

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Explosive material detection apparatus and method using dual...

X-ray or gamma ray systems or devices – Specific application – Absorption
Reexamination Certificate

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Explosives detection system using computed tomography (CT)...

X-ray or gamma ray systems or devices – Specific application – Absorption
Reexamination Certificate

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Explosives detection using resonance fluorescence of bremsstrahl

X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent

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Exposing method and semiconductor device fabricated by the...

X-ray or gamma ray systems or devices – Specific application – Lithography
Reexamination Certificate

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Exposure apparatus

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Exposure apparatus

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Exposure apparatus

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Exposure apparatus

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Exposure apparatus

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Exposure apparatus

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Exposure apparatus

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Exposure apparatus

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Exposure apparatus

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Exposure apparatus

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Exposure apparatus

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Exposure apparatus

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Exposure apparatus and device manufacturing method using the sam

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Exposure apparatus and device manufacturing method using the sam

X-ray or gamma ray systems or devices – Specific application – Lithography
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