Exposure apparatus

Details Exposure apparatus Exposure apparatus

1994-02-28

1994-12-27

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378160, G21K 500

Patent

active

053772512

ABSTRACT:
An exposure method for manufacture of semiconductor devices, includes moving a shutter having an edge so that the edge is related to a predetermined exposure region; projecting an exposure beam to the edge of the shutter and to at least a portion of the exposure region; determining a position of a shadow of the edge of the shutter formed by the exposure beam with respect to a predetermined coordinate system related to movement of a movable chuck; adjusting the shutter in accordance with the determination; placing a substrate on the chuck; moving the chuck so that the substrate is related to the exposure region; and controlling the exposure of the substrate with the exposure beam through the shutter.

Affiliated with

Also associated with

Rating

Exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-924517