X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1993-05-17
1995-02-14
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378150, 378206, G21K 500
Patent
active
053902270
ABSTRACT:
An exposure apparatus for exposing a semiconductor wafer to a semiconductor device pattern formed in a mask. The exposure energy is, for example, X-rays contains in synchrotron orbit radiation. A blade for limiting the area irradiated with the exposure energy on a mask or wafer is integrally movable in an alignment detecting unit for detecting the alignment mark. Four of such blades are provided to provide a square exposure area. The blades are movable independently by the associated alignment detecting units. Each of the blades is finely movable relative to the associated alignment detecting unit. The shape or size or the like of the blade is determined in consideration of the position of the blade in the direction of the exposure energy irradiation, and the maximum and minimum exposure view angle. The blade is cooled. The exposure area can be changed highly accurately and efficiently with a simple structure.
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Ebinuma Ryuichi
Kariya Takao
Mizusawa Nobutoshi
Shimoda Isamu
Uzawa Shunichi
Canon Kabushiki Kaisha
Church Craig E.
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