Exposure apparatus

Details Exposure apparatus Exposure apparatus

1992-11-10

1994-02-08

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378151, G21K 500

Patent

active

052854884

ABSTRACT:
An exposure apparatus includes an exposure beam source for projecting a beam flux for exposure, having a non-uniform intensity distribution, toward a range including an exposure zone, set with respect to a main body of the exposure apparatus; illuminance detectors disposed at least at two points inside the exposure beam flux but outside the exposure zone; and a detecting device for detecting a change in intensity of the exposure beam and a change in relative position of the exposure zone and the exposure beam flux, on the basis of detected illuminances at the two points.

REFERENCES:
patent: 4748646 (1988-05-01), Osada
patent: 4803712 (1989-02-01), Kembo et al.
patent: 4916723 (1990-04-01), Geluk

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