Exposure apparatus

Details Exposure apparatus Exposure apparatus

1990-10-01

1992-08-11

Howell, Janice A.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 35, 73 40, G21K 500

Patent

active

051386437

ABSTRACT:
An exposure apparatus includes a chamber for placing an article in a predetermined ambience; a holding device for holding the article in the chamber; a fluid supplying device for supplying a temperature adjusting fluid into the holding device through a flow passageway; a detecting device for detecting leakage of the fluid from the flow passageway; and a flow rate controlling device for controlling the flow rate of the fluid to be supplied to the holding device on the basis of the detection by the detecting device.

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Okada, et al., "Development of Highly Reliable Synchrotron Radiation Lithography Beamline," J. Vac. Sci. Techol. B6(1), Jan./Feb. 1988, pp. 191 through 194.

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