X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1992-02-05
1992-09-22
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Lithography
378145, 378152, 2504922, G21K 504
Patent
active
051503913
ABSTRACT:
An exposure apparatus for transferring a pattern of an original onto a workpiece, includes a blocking member for defining a rectangular exposure region with respect to at least one of the original and the workpiece, wherein the exposure for the pattern transfer can be effected with the exposure region defined by the blocking member. Plural detection systems detect a positional deviation between the original and the workpiece, each of which is disposed so as to be associated with at least one of four sides of the rectangular exposure region. Plural first movable stages each is provided so as to be associated with at least one of the four sides, and each is adapted to carry thereon one of the detection systems disposed to be associated with a corresponding side. Each first movable stage comprises a single-axis stage movable in a direction parallel to a corresponding side. Plural second stages each carryies thereon corresponding one of the first movable stages, and each comprises a single-axis stage movable in a direction perpendicular to a corresponding side and in a direction parallel to the rectangular exposure region. Each second movable state is operable to displace the light blocking member to change the rectangular exposure region.
REFERENCES:
patent: 4825453 (1989-04-01), Kembo
patent: 4856037 (1989-08-01), Mueller et al.
patent: 4875076 (1989-10-01), Torigoe et al.
patent: 4916322 (1990-04-01), Glauigh et al.
patent: 4999506 (1991-03-01), Mizusawa et al.
Ebinuma Ryuichi
Kariya Takao
Mizusawa Nobutoshi
Suda Shigeyuki
Uzawa Shunichi
Canon Kabushiki Kaisha
Porta David P.
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