X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1997-07-18
1999-07-13
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Lithography
378146, G03G 1504
Patent
active
059237198
ABSTRACT:
An exposure apparatus for projecting radiation light from a synchrotron radiation source to an object to be illuminated. The apparatus includes at least one set of flat surface mirrors disposed along a synchrotron radiation orbital plane and opposed to each other with a principal ray interposed therebetween and also disposed in two stages with respect to a direction of the principal ray. A first-stage flat surface mirror of the flat surface mirrors receives radiation light, emitted from the radiation source along the synchrotron radiation orbital plane, and reflects the same toward a second-stage flat surface mirror of the flat surface mirrors, which opposes the first-stage mirror with the principal ray direction interposed therebetween. At least one projection mirror receives radiation light from the flat surface mirrors and reflects and projects the same toward the object to illuminate it. The radiation light reflected by the second-stage flat surface mirror is deflected by the projection mirror to illuminate an effective region on the object, and the directions of the flat surface mirrors and the direction of radiation light impinging on them are placed in a predetermined relationship regarding a plane defined by radiation light emitted along the synchrotron radiation orbital plane.
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R.P. Haelbich, et al., "Design and Performance of an X-Ray Lithography Beam Line at a Storage Ring", J. Vac. Sci. Tech. B, Second Series, vol. 1, No. 4, Oct.-Dec. 1983, pp. 1262-1266.
Warren D. Grobman, "Handbook on Synchrotron Radiation", vol. 1, Chap. 13, pp. 1133 to 1139, North-Holland Publishing Co., 1983.
Canon Kabushiki Kaisha
Porta David P.
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