X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1997-07-18
1999-09-07
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Lithography
378 85, G03G 1504
Patent
active
059498447
ABSTRACT:
An exposure apparatus for exposing an object with X-rays from a synchrotron radiation light source includes a first mirror for collecting and reflecting synchrotron radiation light emitted from a synchrotron radiation orbit, and a second mirror for receiving synchrotron radiation light reflected by the first mirror and for projecting it toward the object, the second mirror having a reflection surface which is convex with respect to a direction of emission of synchrotron radiation light as reflected by the first mirror, wherein, when a virtual plane perpendicular to the direction of emission of the synchrotron radiation light reflected by the first mirror is set between a center position of the second mirror and an intermediate position between the center position of the second mirror and the position of the object, the first mirror has a reflection surface of a curvature determined so that a line of intersection between the virtual plane and the synchrotron radiation light from the first mirror becomes parallel to the synchrotron radiation orbit.
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Haelbich, et al., "Design and performance of an x-ray lithography beam line at a storage ring", J. Vac. Sci Technol. B1(4), Oct.-Dec. 1983, pp. 1262-1266.
Warren D. Grobman, "Handbook on Synchrotron Radiation", vol. 1, Chap. 13, pp. 1133-1139, North-Holland Publishing Co., 1983.
Canon Kabushiki Kaisha
Porta David P.
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