Exposure apparatus

Details Exposure apparatus Exposure apparatus

1992-12-08

1994-05-31

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378207, G21K 500

Patent

active

053176154

ABSTRACT:
An exposure apparatus and method for exposing a workpiece to a pattern of an original with radiation includes a masking device having movable blades for variably defining an aperture to selectively block and transmit the radiation to define on the workpiece a desired exposure zone corresponding to the aperture, the masking device having a window, and a detector for detecting the positional deviation between the original and the workpiece by using light passing through the window of the masking device.

REFERENCES:
patent: 4589769 (1986-05-01), Matsuki
patent: 4875076 (1989-10-01), Torigoe et al.

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