Exposure apparatus and device manufacturing method using the sam

Details Exposure apparatus and device manufacturing method using the sam Exposure apparatus and device manufacturing method using the sam

1995-07-28

1997-01-21

Wong, Don

X-ray or gamma ray systems or devices

Specific application

Lithography

378145, 378151, 378150, G21K 500

Patent

active

055966187

ABSTRACT:
An exposure apparatus includes a holder for holding a substrate to be exposed, and a movable shutter movable across a path of exposure light, having an intensity distribution in a predetermined direction, and in a direction intersecting the predetermined direction, wherein the movable shutter has an edge with a protruded portion being protruded in the movement direction and having a shape and size determined on the bases of the intensity distribution of the exposure light.

REFERENCES:
patent: 4754147 (1988-06-01), Maughan et al.
patent: 4794629 (1988-12-01), Pastyr et al.
patent: 4868844 (1989-09-01), Nunan
patent: 5172402 (1992-12-01), Mizusawa et al.
patent: 5237599 (1993-08-01), Gunji et al.

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