Exposure apparatus

Details Exposure apparatus Exposure apparatus

1993-04-13

1994-03-29

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378206, 2504922, G21K 500

Patent

active

052992519

ABSTRACT:
An exposure apparatus for a semiconductor wafer, a liquid crystal display panel and so on. The exposure apparatus comprises a light source, a holding means for a mask and a target, a moving means for moving the holding means and optical alignment systems. The optical alignment system has a moving base on which a detecting means is installed. The moving bases are arranged in the same plane and have narrow portions in their front.

REFERENCES:
patent: 4777641 (1988-10-01), Inagaki et al.

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