Exposure apparatus

Details Exposure apparatus Exposure apparatus

1991-12-06

1992-11-03

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378151, 378152, 359232, 359889, G21K 500

Patent

active

051611767

ABSTRACT:
An exposure apparatus includes a light source for exposing a wafer through a mask; a light blocking device being movable and effective to block light from the light source to limit an exposure zone; a positional deviation detecting system for detecting positional deviation between the mask and the wafer; and a drive control system for moving the light blocking device to execute position control therefor, on the basis of a detection signal from the positional deviation detecting system.

REFERENCES:
patent: 3668990 (1972-06-01), Hayes
patent: 3984680 (1976-10-01), Smith
patent: 4777641 (1988-10-01), Inagaki et al.
patent: 4881257 (1989-11-01), Nakagawa
patent: 4887282 (1989-12-01), Mueller
patent: 4891833 (1990-01-01), Bernardi
Patent Abstracts of Japan, Kokai No. 61-131445, vol. 10, No. 319, Oct. 30, 1986.

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