Exposure apparatus

Details Exposure apparatus Exposure apparatus

1997-11-04

1998-11-10

Wong, Don

X-ray or gamma ray systems or devices

Specific application

Lithography

378150, G21K 500

Patent

active

058355600

ABSTRACT:
An exposure apparatus includes a mirror for reflecting radiation light from a light source, a driving mechanism for holding and oscillating the mirror, a detector for detecting the position of a beam of the radiation light projected on the mirror, an adjusting mechanism for adjusting the position of the mirror with respect to the radiation light on the basis of an output of the detector, and a reference table for positioning the driving mechanism and the detector with respect to the same reference.

REFERENCES:
patent: 5123036 (1992-06-01), Uno et al.
patent: 5125014 (1992-06-01), Watanabe et al.
patent: 5157700 (1992-10-01), Kurosawa et al.
patent: 5285488 (1994-02-01), Watanabe et al.
patent: 5394451 (1995-02-01), Miyake et al.
patent: 5444758 (1995-08-01), Miyake et al.
patent: 5488612 (1996-01-01), Kasumi et al.

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