Exposure apparatus

Details Exposure apparatus Exposure apparatus

1994-01-18

1995-03-14

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378210, G21K 500

Patent

active

053982711

ABSTRACT:
A exposure apparatus for a semiconductor wafer, a liquid crystal display panel and so on. The exposure apparatus comprises a light source, a holding means and a moving means. The light source exposes a target such as a semiconductor wafer, a liquid crystal display panel and so on. The holding means alternately holds and releases the target. The moving means for moving the holding means includes a table and a shifting means. The table moves in the direction of the light source. The shifting means shifts the holding means toward or against the table.

REFERENCES:
patent: 4475223 (1984-10-01), Taniguchi et al.
patent: 4870668 (1989-09-01), Frankel et al.
patent: 4969168 (1990-11-01), Sakamoto et al.
patent: 5197089 (1993-03-01), Baker
Brochure for SUSS XRS 200 X-Ray Stepper by Karl Suss, Inc.

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