Using a carbon film as an etch hardmask for hard-to-etch...
Using a critical composition grading technique to deposit...
Using a first liner layer as a spacer in a semiconductor device
Using a submicron level dimension reference
Using a superlattice to determine the temperature of a semicondu
Using a time invariant statistical process variable of a...
Using acoustic energy including two lasers to activate...
Using an extra boron implant to improve the NMOS reverse narrow
Using an organic layer as an ion implantation mask when forming
Using crack arrestor for inhibiting damage from dicing and...
Using different gate dielectrics with NMOS and PMOS...
Using different gate dielectrics with NMOS and PMOS...
Using electrically programmable fuses to hide architecture,...
Using electrophoresis to produce a conformally coated...
Using epitaxially grown wells for reducing junction...
Using fast hot-carrier aging method for measuring plasma...
Using grooves as alignment marks when dicing an encapsulated sem
Using H2anneal to improve the electrical characteristics of...
Using high temperature H2 anneal to recrystallize S/D and...
Using implantation method to control gate oxide thickness on...