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Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Trench isolation method for semiconductor integrated circuit

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Trench isolation method in flash memory device

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Trench isolation method of semiconductor device

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Trench isolation method with an epitaxially grown capping layer

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Trench isolation method with an epitaxially grown capping layer

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Trench isolation methods including plasma chemical vapor deposit

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Trench isolation methods utilizing composite oxide films

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Trench isolation of field effect transistors

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Having air-gap dielectric

Trench isolation process

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Trench isolation process to deposit a trench fill oxide...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Trench isolation process using nitrogen preconditioning to reduc

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Trench isolation processes using polysilicon-assisted fill

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Trench isolation structure and a method of manufacture therefor

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Trench isolation structure and fabrication method thereof

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Trench isolation structure and method for same

Utility Patent

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Trench isolation structure and method of formation

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Trench isolation structure and method of manufacture therefor

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Trench isolation structure for a semiconductor device with...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Trench isolation structure for a semiconductor device with...