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Deposition methods with time spaced and time abutting...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from gaseous state combined with preceding...
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Deposition of a conductor in a via hole or trench

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Deposition of amorphous silicon films by high density plasma...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Deposition of amorphous silicon-containing films

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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Deposition of an oxide layer to facilitate photoresist...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Deposition of carbon and nitrogen doped poly silicon films,...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Deposition of carbon into nitride layer for improved selectivity

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Deposition of conformal copper seed layers by control of...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Deposition of device quality, low hydrogen content, amorphous si

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Deposition of device quality, low hydrogen content, hydrogenated

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Deposition of device quality, low hydrogen content,...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Deposition of diffusion barrier

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Deposition of dopant impurities and pulsed energy drive-in

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – By application of corpuscular or electromagnetic radiation
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Deposition of dopant impurities and pulsed energy drive-in

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – By application of corpuscular or electromagnetic radiation
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Deposition of film layers by alternately pulsing a precursor...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Deposition of group III-nitrides on Ge

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from gaseous state combined with preceding...
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Deposition of hafnium oxide and/or zirconium oxide and...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Deposition of in-situ doped semiconductor film and undoped...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Deposition of integrated circuit fabrication materials using...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Deposition of low dielectric constant thin film without use...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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