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Selected: C

Cerdip type of solid-state image sensing device, structure...

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor
Reexamination Certificate

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Ceria based slurry for chemical-mechanical polishing

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Ceria removal in chemical-mechanical polishing of integrated...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Cerium oxide abrasive for polishing insulating films formed...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Cerium oxide abrasives for chemical mechanical polishing

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Cerium oxide abrasives for chemical mechanical polishing

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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CF4+H2O plasma ashing for reduction of contact/via...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Chalcogenide memory cell with a plurality of chalcogenide electr

Semiconductor device manufacturing: process – Direct application of electrical current
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Chamber for reducing contamination during chemical vapor deposit

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material
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Chamber seasoning method to improve adhesion of F-containing...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Channel dopant implantation with automatic compensation for vari

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Channel formation after source and drain regions are formed

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Channel hot electron programmed memory device having...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Channel implant through gate polysilicon

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Channel implant through gate polysilicon

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Channel orientation to enhance transistor performance

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Channel stop implant profile shaping scheme for field isolation

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation
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Channel stop ion implantation method for CMOS integrated...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Channel strain engineering in field-effect-transistor

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Channel-type stack capacitor for DRAM cell

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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