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N-type buried layer drive-in recipe to reduce pits over...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region

Reexamination Certificate

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Narrow energy band gap gallium arsenide nitride...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region

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NiSi contacting extensions of active regions

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region

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Nitride semiconductor device comprising bonded substrate and...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region

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Nitride semiconductor device comprising bonded substrate and...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region

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Nitride-based semiconductor laser device and method of...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region

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Nitrogen implanted polysilicon gate for MOSFET gate oxide harden

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region

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Non-thermal annealing with electromagnetic radiation in the...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region

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Non-thermal process for annealing crystalline materials

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – By application of corpuscular or electromagnetic radiation

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Notched-base spacer profile for non-planar transistors

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Plasma

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Optimal spike anneal ambient

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region

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Optimization of S/D annealing to minimize S/D shorts in...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region

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Optimization of thermal cycle for the formation of pocket...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into...

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Opto-electronic device with self-aligned ohmic contact layer

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Diffusing a dopant

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Overvoltage-protected light-emitting semiconductor device,...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Diffusing a dopant

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Passivation film and method of forming the same

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – By application of corpuscular or electromagnetic radiation

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Pattern formation method

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Diffusing a dopant

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Patterning of devices

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – By application of corpuscular or electromagnetic radiation

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PECVD nitride film

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Plasma

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Phosphorous doping a semiconductor particle

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Diffusing a dopant

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