Fabrication of metal contacts for deep-submicron technologies

Fully nickel silicided metal gate with shallow junction formed

Fully silicided gate electrodes and method of making the same

FUSI integration method using SOG as a sacrificial...

FUSI integration method using SOG as a sacrificial...

Manufacturing method for semiconductor device having a T...

Metal silicide induced lateral excessive encroachment...

Metal-halogen physical vapor deposition for semiconductor...

Method and apparatus for low temperature deposition of CVD and P

Method for fabricating semiconductor device using a nickel...

Method for forming a semiconductor device having a silicide...

Method for high temperature metal deposition for reducing...

Method for patterning a metal or metal silicide layer and a...

Method for producing schottky diodes

Method for producing Schottky diodes and Schottky diodes

Method of eliminating source/drain junction spiking, and...

Method of fabricating a nickel silicide layer by conducting...

Method of fabricating conductive lines with silicide layer

Method of forming CVD titanium film

Method of forming relatively continuous silicide layers for...