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Mixed orientation and mixed material...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Multi-gate transistor formed with active patterns of uniform...

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Multilayer structure and fabrication thereof

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Nanostructure arrays and methods of making same

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Nitride semiconductor device and fabrication method thereof,...

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Nitride semiconductor device and process for producing the same

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Nitride semiconductor light-emitting device having high...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Nitride semiconductor substrate and method for manufacturing...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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P-i-n transit time silicon-on-insulator device

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Pattern forming method for a display device

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Patterned SOI by oxygen implantation and annealing

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Patterned strained silicon for high performance circuits

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Pendeoepitaxial methods of fabricating gallium nitride...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Pendeoepitaxial methods of fabricating gallium nitride...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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PENDEOEPITAXIAL METHODS OF FABRICATING GALLIUM NITRIDE...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Plasma CVD apparatus, method for manufacturing...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Plasma immersion ion implantation process with chamber...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Process for producing an epitaxial layer of gallium nitride...

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Product including a silicon-containing functional layer and...

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Production method for SIMOX substrate and SIMOX substrate

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