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2N mask design and method of sequential lateral solidification

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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3-D integrated circuit system and method

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Abrupt “delta-like” doping in Si and SiGe...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Abrupt delta-like doping in Si and SiGe films by UHV-CVD

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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Adhesion of carbon doped oxides by silanization

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Advanced isolation scheme for deep submicron technology

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from gaseous state combined with preceding...
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Al x In y Ga 1-x-y N mixture crystal substrate, method of...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Ammonia-treated polysilicon semiconductor device

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Polycrystalline semiconductor
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Amorphization/templated recrystallization method for hybrid...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Amorphous and polycrystalline growing method for gallium...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Amorphous silicon crystallization method

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Amorphous silicon crystallization method

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Apparatus and method for depositing a semiconductor material

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Apparatus and method for forming a deposited film on a...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Apparatus and method for forming deposited film

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Apparatus and method for forming single crystalline nitride...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Polycrystalline semiconductor
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Apparatus and method for transformation of substrate

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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Apparatus and method for transformation of substrate

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Apparatus for depositing silicon-based thin film and method...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Apparatus for fabricating compound semiconductor device

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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