Narrow width effect improvement with photoresist plug...
Narrow width effect improvement with photoresist plug...
Narrow width trenches for field isolation in integrated circuits
Nitridation of STI liner oxide for modulating inverse width...
Nitriding pretreatment of ONO nitride for oxide deposition
Nitridization of STI sidewalls
Nitrogenated trench liner for improved shallow trench isolation
Non-critical complementary masking method for poly-1...
Non-polishing sacrificial layer etchback planarizing method for
Optical semiconductor device and manufacturing method for same
Organic sidewall spacers used with resist
Oxidation barrier composed of a silicide alloy for a thin film a
Oxide deglaze before sidewall oxidation of mesa or trench
Oxide etch barrier formed by nitridation
Oxynitride shallow trench isolation and method of formation
Ozone vapor clean method
Passivation of deep isolating separating trenches with sunk...
Photodiode with tightly-controlled junction profile for CMOS...
Pitcher-shaped active area for field effect transistor and...
Pitcher-shaped active area for field effect transistor and...