Method to engineer the inverse narrow width effect (INWE) in...
Method to fill deep trench structures with void-free...
Method to form a balloon shaped STI using a micro machining...
Method to form narrow and wide shallow trench isolations...
Method to form selective strained Si using lateral epitaxy
Method to form shallow trench isolation structures
Method to form shallow trench isolation structures with improved
Method to form shallow trench isolations
Method to form shallow trench isolations
Method to form shallow trench isolations without a chemical...
Method to improve SRAM performance and stability
Method to improve STI nano gap fill and moat nitride pull back
Method to increase effective MOSFET width
Method to increase the coupling ratio of word line to floating g
Method to make shallow trench isolation structure by HDP-CVD and
Method to prevent dishing in chemical mechanical polishing
Method to prevent the formation of a thinner portion of insulati
Method to reduce a reverse narrow channel effect for MOSFET...
Method to reduce defects in shallow trench isolations by...
Method to reduce junction leakage current in strained...