4. Semiconductor device manufacturing: process
  5. Coating with electrically or thermally conductive material
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Etch stop layer in poly-metal structures

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Reexamination Certificate

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Etch stop layer in poly-metal structures

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Reexamination Certificate

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Etch stop layer in poly-metal structures

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Etch stop layer in poly-metal structures

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Etchant and method for fabricating electric device including...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Etchant and method for forming bumps

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Etchant and method of etching

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Etching an organic material layer, particularly for...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Etching high aspect contact holes in solid state devices

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Etching mask, process for forming contact holes using same,...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Etching material and etching process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Etching method

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Etching method

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Etching method and method for forming contact opening

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Etching method for semiconductor element

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Etching of structures with high topography

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Etching of structures with high topography

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Etching openings of different depths using a single mask...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Etching process for forming damascene structure of the...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Etching process for forming the trench with high aspect ratio

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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