LandOfFree - US Patents - Listing for Semiconductor device manufacturing: process,Coating with electrically or thermally conductive material

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Sacrificial germanium layer for formation of a contact

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Sacrificial inorganic polymer intermetal dielectric...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Sacrificial inorganic polymer intermetal dielectric...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Sacrificial layer for protection during trench etch

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Sacrificial metal spacer damascene process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Sacrificial metal spacer damascene process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Sacrificial metal spacer damascene process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Sacrificial stop layer and endpoint for metal CMP

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Sacrificial TiN arc layer for increased pad etch throughput

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation

Salicide formation process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation

Salicide formation process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Salicide integrated solution for embedded virtual-ground memory

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation

Salicide method for producing a semiconductor device using...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Salicide process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Salicide process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Salicide process for selectively forming a monocobalt disilicide

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Salicide process utilizing a cluster ion implantation process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Sandwiched metal structure silicidation for enhanced contact

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Scaled interconnect anodization for high frequency applications