Fabrication methods of semiconductor integrated circuit...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...

Reexamination Certificate

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C700S121000, C716S030000

Reexamination Certificate

active

10224375

ABSTRACT:
Under the condition that a semiconductor maker and a photomask maker are separated but these are mutually connected with a communication line, the semiconductor maker gives a photomask fabrication schedule information to the photomask maker via the communication line, while the photomask maker fabricates the photomask depending on such fabrication schedule information and delivers the photomask to the semiconductor maker. The photomask maker periodically sends, in the course of fabrication process, a photomask fabrication progress information to the semiconductor maker via the communication line. The semiconductor maker regenerates the photomask fabrication schedule information depending on the photomask fabrication progress information sent from the photomask maker and then transfers the re-generated photomask fabrication schedule information to the photomask maker via the communication line. Therefore, mismatch between fabrication of semiconductor integrated circuit device and supply of photomask can be reduced or eliminated.

REFERENCES:
patent: 6-332150 (1994-12-01), None
patent: 8-7003 (1996-01-01), None
patent: 11-184065 (1999-07-01), None
Shigeo Shingo A Study of the Toyota Production From an Industrial Engineering Viewpoint Productivity Press 1981 (english translation 1989) pp. 4.26-27,90-91, 126, 176, 182-183.
Yasuhiro Monden Toyota Production System Industrial Engineering and Management Press 1993 pp. 98-99.
Shigeo Shingo A Study of the Toyota Production From an Industrial Engineering Viewpoint Productivity Press (1981 (English re-translation 1989) p. 104.
Shigeo Shingo A Study of the Toyota Production From an Industrial Engineering Viewpoint Productivity Press (1981 (English re-translation 1989) pp. 87, 197,205,210.
English language translation of JP11-184065 date of publication Jul. 9, 1999, Applicant: NEC CORP, “System and Method for Processing Mask Data and Storage Medium Where They Are Written”.

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