Fabrication of self-assembled monolayers

Details Fabrication of self-assembled monolayers Fabrication of self-assembled monolayers

2006-08-29

2006-08-29

Ghyka, Alexander (Department: 2812)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

C438S780000, C427S250000, C427S255170

Reexamination Certificate

active

07098145

ABSTRACT:
A self-assembled monolayer (SAM) is fabricated using either a semi-fluorinated sulphur containing compound, or a sem-fluorinated silane derivative and compressed carbon dioxide (CO2) as the solvent medium. The temperature and/or pressure of the compressed CO2may be varied during the fabrication process to improve the molecular packing density of the monolayer.By using compressed CO2as the solvent medium, monolayers with good molecular packing density can be fabricated relatively quickly without the use of environmentally unfriendly solvents.

REFERENCES:
patent: 5108799 (1992-04-01), Hoy et al.
patent: 6183815 (2001-02-01), Enick et al.
patent: 6413574 (2002-07-01), Romack et al.
patent: 8-88402 (1996-04-01), None
patent: 10-217457 (1998-08-01), None
patent: 11-15000 (1999-01-01), None
patent: 99/038695 (1999-08-01), None
H. Fukushima and 2 others, “Microstructure, Wettability, and Thermal Stability of Semifluorinated Self-Assembled Monolayers (SAMs) on Gold” J. Phys. Chem. B 2000, 104, pp. 7417-7423.
Notification of Reasons of Rejection dated Jun. 8, 2005 in corresponding Japanese application No. JP2001-370544.

Affiliated with

Also associated with

Rating

Fabrication of self-assembled monolayers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fabrication of self-assembled monolayers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fabrication of self-assembled monolayers will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3673657