Fabrication of enclosed nanochannels using silica nanoparticles

Details Fabrication of enclosed nanochannels using silica nanoparticles Fabrication of enclosed nanochannels using silica nanoparticles

2006-10-16

2010-11-02

Garber, Charles D (Department: 2812)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S758000, C438S761000, C438S763000, C438S800000, C977S780000, C977S840000, C257SE21487

Reexamination Certificate

active

07825037

ABSTRACT:
In accordance with the invention, there is a method of forming a nanochannel including depositing a photosensitive film stack over a substrate and forming a pattern on the film stack using interferometric lithography. The method can further include depositing a plurality of silica nanoparticles to form a structure over the pattern and removing the pattern while retaining the structure formed by the plurality of silica nanoparticles, wherein the structure comprises an enclosed nanochannel.

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